Carte Photoelasticity Masataka Nisida

Photoelasticity

Proceedings of the International Symposium on Photoelasticity, Tokyo, 1986

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Legare: Carte broșată
Disponibilitate: În depozitul extern
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Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, re...

Informații despre carte

Limbă
engleză
Legare
Carte - Carte broșată
Publicat
2011
Pagini
292
EAN
9784431680413
ISBN
4431680411
Enbook ID
02112614
Greutate
542
Dimensiuni
170 x 244 x 17

Descriere completă

Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo elasticity in a broad sense, including, in addition to long estab lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre hensive collection of photoelastic expertises.

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