Carte Atomic Layer Deposition Tommi Kaariainen

Atomic Layer Deposition

Principles, Characteristics, and Nanotechnology Applications

Limbă: engleză
Legare: Copertă tare
Disponibilitate: În depozitul extern
Expediem în 9-15 zile
1 154.46 lei
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf...

Informații despre carte

Limbă
engleză
Legare
Carte - Copertă tare
Publicat
2013
Pagini
272
EAN
9781118062777
ISBN
1118062779
Enbook ID
04949772
Greutate
582
Dimensiuni
240 x 164 x 25

Descriere completă

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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