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Atom Lithography

From Newtonian to Path integral approach

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Legare: Carte broșată
Disponibilitate: În depozitul extern
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236.02 lei
This book discusses two approaches used as the tools to study atom lithography. The book begins with...

Informații despre carte

Limbă
engleză
Legare
Carte - Carte broșată
Publicat
2010
Pagini
76
EAN
9783843371964
Enbook ID
07116200
Greutate
130
Dimensiuni
150 x 220 x 5

Descriere completă

This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated.

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